Japan's firm develops new plasma method for perovskite manufacturing

Japan’s Sumitomo Heavy Industries (SHI) has developed a novel plasma-based method called Reactive Plasma Deposition (RPD) to manufacture the electron transport layer (ETL) in perovskite solar cells. This layer is crucial as it facilitates electron flow from the perovskite to the electrode. Unlike traditional ETL fabrication methods that involve high temperatures, harsh particles, or toxic gases—often damaging the fragile perovskite material—SHI’s RPD deposits ultra-thin tin oxide (SnO₂) films at low temperatures using non-hazardous gases. This approach is reportedly 200 times faster and costs only about 0.5% of current ETL manufacturing expenses, making it safer, more environmentally friendly, and highly suitable for mass production. While the technology represents a significant breakthrough by enabling low-cost, scalable, and damage-minimized ETL production, SHI acknowledges challenges remain, such as high material costs and handling flammable or toxic precursor gases,